Deep Eutectic Inks for Multiphoton 3D Laser Microprinting

P Philipp Mainik (Institute For Molecular Systems Engineering and Advanced Materials Heidelberg University Heidelberg Germany) C Christoph A. Spiegel (Institute for Molecular Systems Engineering and Advanced Materials (IMSEAM) Heidelberg University 69120 Heidelberg Germany) J Jonathan L.G. Schneider (Institute of Applied Physics Karlsruhe Institute of Technology (KIT) 76131 Karlsruhe Germany) M Martin Wegener E Eva Blasco (Institute for Molecular Systems Engineering and Advanced Materials Heidelberg University Heidelberg Germany)

Abstract

AbstractMultiphoton 3D laser printing of polymers has become a widespread technology for manufacturing 3D architectures on the micro‐ and nanometer scale, with booming applications in micro‐optics, micro‐robotics, and micro‐scaffolds for biological cell culture. However, many applications demand material properties that are not accessible by conventional polymer inks. These include large stiffness, for which recent breakthroughs based on inorganic materials have been reported. Conversely, some applications require very low stiffness and high mechanical compliance. Existing solutions achieve softness by low crosslinking densities, at the inherent expense of deteriorated spatial resolution and structure quality. Herein, this apparent contradiction is resolved by introducing multiphoton inks based on deep eutectic systems, comprising Lewis or Brønsted acids/bases. The 3D printed materials support extremely large strains and bulk Young's moduli as low as 260 kPa under aqueous conditions, well suited for biological applications – at comparable ease of use and spatial resolution as well‐established commercially available polymer inks.

Article Details

Volume / Issue Vol. 37, Issue 38
Published September 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (5)

P

Philipp Mainik

Institute For Molecular Systems Engineering and Advanced Materials Heidelberg University Heidelberg Germany

C

Christoph A. Spiegel

Institute for Molecular Systems Engineering and Advanced Materials (IMSEAM) Heidelberg University 69120 Heidelberg Germany

J

Jonathan L.G. Schneider

Institute of Applied Physics Karlsruhe Institute of Technology (KIT) 76131 Karlsruhe Germany

M

Martin Wegener

E

Eva Blasco

Institute for Molecular Systems Engineering and Advanced Materials Heidelberg University Heidelberg Germany