Effect of Atomic Layer Deposition of Ultra‐Thin Oxide on Reactivity and Durability of Perovskite Oxygen Electrodes (Adv. Mater. 32/2026)
J
Jongsu Seo
(Korea Institute of Energy Research)
S
SungHyun Jeon
(Research Institute of Advanced Materials Seoul National University Seoul Republic of Korea)
H
Hyunseung Kim
(Research Institute of Advanced Materials)
S
San Kwak
(Department of Materials Science and Engineering Seoul National University Seoul Republic of Korea)
D
DongHwan Oh
(Korea Advanced Institute of Science and Technology (KAIST) , , ,)
B
Bonjae Koo
(School of Chemistry and Energy)
J
Jinwook Kim
J
Jeong Hwan Kim
W
WooChul Jung
(Research Institute of Advanced Materials)
Article Details
Journal
Advanced Materials
Volume / Issue
Vol. 38, Issue 32
Published
June 01, 2026
ISSN
0935-9648
Publisher
Unknown Publisher
Authors (9)
J
Jongsu Seo
Korea Institute of Energy Research
S
SungHyun Jeon
Research Institute of Advanced Materials Seoul National University Seoul Republic of Korea
H
Hyunseung Kim
Research Institute of Advanced Materials
S
San Kwak
Department of Materials Science and Engineering Seoul National University Seoul Republic of Korea
D
DongHwan Oh
Korea Advanced Institute of Science and Technology (KAIST) , , ,
B
Bonjae Koo
School of Chemistry and Energy
J
Jinwook Kim
J
Jeong Hwan Kim
W
WooChul Jung
Research Institute of Advanced Materials
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