Effect of Atomic Layer Deposition of Ultra‐Thin Oxide on Reactivity and Durability of Perovskite Oxygen Electrodes (Adv. Mater. 32/2026)

J Jongsu Seo (Korea Institute of Energy Research) S SungHyun Jeon (Research Institute of Advanced Materials Seoul National University Seoul Republic of Korea) H Hyunseung Kim (Research Institute of Advanced Materials) S San Kwak (Department of Materials Science and Engineering Seoul National University Seoul Republic of Korea) D DongHwan Oh (Korea Advanced Institute of Science and Technology (KAIST) , , ,) B Bonjae Koo (School of Chemistry and Energy) J Jinwook Kim J Jeong Hwan Kim W WooChul Jung (Research Institute of Advanced Materials)

Article Details

Volume / Issue Vol. 38, Issue 32
Published June 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (9)

J

Jongsu Seo

Korea Institute of Energy Research

S

SungHyun Jeon

Research Institute of Advanced Materials Seoul National University Seoul Republic of Korea

H

Hyunseung Kim

Research Institute of Advanced Materials

S

San Kwak

Department of Materials Science and Engineering Seoul National University Seoul Republic of Korea

D

DongHwan Oh

Korea Advanced Institute of Science and Technology (KAIST) , , ,

B

Bonjae Koo

School of Chemistry and Energy

J

Jinwook Kim

J

Jeong Hwan Kim

W

WooChul Jung

Research Institute of Advanced Materials