Heteroepitaxial Strain Engineering and Interfacial Energy Transfer Boosting Optoelectronic Properties in C <sub>60</sub> /WS <sub>2</sub> van der Waals Heterostructures

J Jing Guo Z Zhichao Cheng J Jiarong Liu (State Key Laboratory of Environment Characteristics and Effects for Near-space, Beijing Key Laboratory of Intelligent Molecular Materials and High-throughput Manufacturing, Key Laboratory of Cluster Science, Ministry of Education of China, School of Chemistry and Chemical Engineering) H Haotian Guo B Bilu Liu (Shenzhen Geim Graphene Center, Shenzhen Key Laboratory of Advanced Layered Materials for Value-added Applications, Tsinghua-Berkeley Shenzhen Institute and Institute of Materials Research) S Soohyung Park Z Zikai He (School of Science, Harbin Institute of Technology (Shenzhen) 3 , Shenzhen, Guangdong 518055,) H Hui‐Ming Cheng (Faculty of Materials Science and Energy Engineering Shenzhen University of Advanced Technology Shenzhen China) N Norbert Koch (Helmholtz-Zentrum Berlin für Materialien und Energie GmbH 3 , 14109 Berlin,) X Xiaomin Xu (Curtin Centre for Advanced Energy Materials and Technologies (CAEMT), Western Australian School of Mines (WASM))

Abstract

Abstract Engineered van der Waals (vdW) heterostructures, combining molecular semiconductors and atomically flat nanomaterials, offer vast opportunities to tailor optoelectronic properties at heterointerfaces. Here, the heteroepitaxial assembly of C 60 molecules on monolayer tungsten disulfide (ML‐WS 2 ), where an anisotropic compression strain within the C 60 lattice at the heterointerface induces the formation of 1D polymeric C 60 strings and activates otherwise symmetry‐forbidden S 1 → S 0 optical transitions, is reported. This, coupled with interfacial energy transfer from ML‐WS 2 to C 60 , results in a remarkable 310% enhancement in the PL intensity compared to disordered C 60 aggregates. The resulting C 60 /ML‐WS 2 transistors exhibit superior electrical and optoelectronic performance, achieving a charge carrier mobility of 10.4 cm 2 V −1 s −1 , facilitated by an ultralow 230 meV contact barrier with Au electrodes. These devices demonstrate a superior photoresponsivity of 46.4 A W −1 and a detectivity of 3.6 × 10 12 Jones, greatly outperforming pristine ML‐WS 2 counterpart devices.

Article Details

Volume / Issue Vol. 38, Issue 5
Published January 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (10)

J

Jing Guo

Z

Zhichao Cheng

J

Jiarong Liu

State Key Laboratory of Environment Characteristics and Effects for Near-space, Beijing Key Laboratory of Intelligent Molecular Materials and High-throughput Manufacturing, Key Laboratory of Cluster Science, Ministry of Education of China, School of Chemistry and Chemical Engineering

H

Haotian Guo

B

Bilu Liu

Shenzhen Geim Graphene Center, Shenzhen Key Laboratory of Advanced Layered Materials for Value-added Applications, Tsinghua-Berkeley Shenzhen Institute and Institute of Materials Research

S

Soohyung Park

Z

Zikai He

School of Science, Harbin Institute of Technology (Shenzhen) 3 , Shenzhen, Guangdong 518055,

H

Hui‐Ming Cheng

Faculty of Materials Science and Energy Engineering Shenzhen University of Advanced Technology Shenzhen China

N

Norbert Koch

Helmholtz-Zentrum Berlin für Materialien und Energie GmbH 3 , 14109 Berlin,

X

Xiaomin Xu

Curtin Centre for Advanced Energy Materials and Technologies (CAEMT), Western Australian School of Mines (WASM)