High‐Performance Air‐Stable Polymer Monolayer Transistors for Monolithic 3D CMOS logics (Adv. Mater. 8/2026)

M Miao Cheng Y Yanqin Zhang (State Key Laboratory of Fabrication Technologies for Integrated Circuits Chinese Academy of Sciences Beijing 100029 China) J Jinyao Wang H Haonan Wang (Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, School of Information and Electronic Engineering) Y Yifan Xie S Shuaidi Zhang (State Key Laboratory of Fabrication Technologies for Integrated Circuits Chinese Academy of Sciences Beijing 100029 China) C Changrui Liu (State Key Laboratory of Fabrication Technologies for Integrated Circuits Chinese Academy of Sciences Beijing 100029 China) J Jingyun Chu (State Key Laboratory of Fabrication Technologies for Integrated Circuits Chinese Academy of Sciences Beijing 100029 China) F Feng Zhang Z Zhenzhong Yang (Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, School of Information and Electronic Engineering) Z Zilong Zheng M Mingjian Wu (Institute of Micro- and Nanostructure Research (IMN) & Center for Nanoanalysis and Electron Microscopy (CENEM)) L Ling Li M Mengmeng Li

Article Details

Volume / Issue Vol. 38, Issue 8
Published February 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (14)

M

Miao Cheng

Y

Yanqin Zhang

State Key Laboratory of Fabrication Technologies for Integrated Circuits Chinese Academy of Sciences Beijing 100029 China

J

Jinyao Wang

H

Haonan Wang

Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, School of Information and Electronic Engineering

Y

Yifan Xie

S

Shuaidi Zhang

State Key Laboratory of Fabrication Technologies for Integrated Circuits Chinese Academy of Sciences Beijing 100029 China

C

Changrui Liu

State Key Laboratory of Fabrication Technologies for Integrated Circuits Chinese Academy of Sciences Beijing 100029 China

J

Jingyun Chu

State Key Laboratory of Fabrication Technologies for Integrated Circuits Chinese Academy of Sciences Beijing 100029 China

F

Feng Zhang

Z

Zhenzhong Yang

Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, School of Information and Electronic Engineering

Z

Zilong Zheng

M

Mingjian Wu

Institute of Micro- and Nanostructure Research (IMN) & Center for Nanoanalysis and Electron Microscopy (CENEM)

L

Ling Li

M

Mengmeng Li