Increased Endurance of Nonvolatile Photonics Enabled by Nanostructured Phase‐Change Materials

J Jayita Dutta (Department of Electrical and Computer Engineering University of Washington Seattle Washington USA) A Andrew Tang B Brian Mills R Rui Chen A Arnab Manna G Gokul Nath SJ (Department of Electrical and Computer Engineering University of Washington Seattle Washington USA) V Virat Tara D Dennis Callahan (The Charles Stark Draper Laboratory Cambridge Massachusetts USA) C Cosmin Constantin Popescu (Department of Materials Science and Engineering Massachusetts Institute of Technology Cambridge Massachusetts USA) J Juejun Hu A Arka Majumdar

Abstract

ABSTRACT The rapid rise of artificial intelligence, and in‐memory computing has reinvigorated research on scalable, energy‐efficient, and reconfigurable photonic hardware. Non‐volatile phase‐change materials (PCMs) are attractive, as they offer large refractive index contrast, wavelength‐scale footprints, and zero static power consumption. However, current PCM‐based electrically controlled photonic devices are plagued by high insertion loss and low endurance. One prevalent hypothesis for these material limitations come from electromagnetic scattering in the interface and large programming volumes, respectively. Here, we validate this hypothesis by showing that nano‐structuring of PCM minimizes optical loss and enhances the endurance. By tapering both ends of a wide bandgap PCM Sb 2 Se 3 segment on a silicon waveguide, we suppressed the insertion loss by ≈94% (resulting in a loss of ≈0.1 dB per π phase shift). Through combining tapering and segmentation, we achieved high optical modulation amplitude (≈70%), low loss (≈0.5 dB per π phase shift), low‐voltage (<5 V) actuation, and record high endurance greater than 100 million cycles. This work showcases the substantial advantage of nanopatterning PCMs to attain low loss and high cyclability.

Article Details

Volume / Issue Vol. 38, Issue 31
Published June 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (11)

J

Jayita Dutta

Department of Electrical and Computer Engineering University of Washington Seattle Washington USA

A

Andrew Tang

B

Brian Mills

R

Rui Chen

A

Arnab Manna

G

Gokul Nath SJ

Department of Electrical and Computer Engineering University of Washington Seattle Washington USA

V

Virat Tara

D

Dennis Callahan

The Charles Stark Draper Laboratory Cambridge Massachusetts USA

C

Cosmin Constantin Popescu

Department of Materials Science and Engineering Massachusetts Institute of Technology Cambridge Massachusetts USA

J

Juejun Hu

A

Arka Majumdar