Inner‐Layer Indium Doping Achieved Highly Active and Stable Sulfur Vacancies in MoS <sub>2</sub> for Superior Sulfur Redox Kinetics

Q Qingbin Jiang H Huifang Xu K Kwan San Hui Y Yijie Wei (School of Pharmacy Nanchang University Nanchang China) L Lingwen Liu Z Zhengqing Ye (Joint Key Laboratory of the Ministry of Education Institute of Applied Physics and Materials Engineering University of Macau Avenida da Universidade Taipa Macau SAR China) C Chenyang Zha M Mengting Zheng J Jun Lu K Kwun Nam Hui (Joint Key Laboratory of the Ministry of Education, Institute of Applied Physics and Materials Engineering, University of Macau, Avenida da Universidade, Taipa, Macau, SAR 999078, P. R. China)

Abstract

Abstract Defect engineering in MoS 2 via sulfur vacancies (Vs‐MoS 2 ) has shown potential in enhancing lithium–sulfur battery (LSB) performance by mitigating the polysulfide shuttle effect. However, the high surface energy of Vs‐MoS 2 impedes long‐term catalyst stability. Herein, indium (In) doping is introduced into the inner layer of Vs‐MoS 2 lattice (In‐Vs‐MoS 2 ), which effectively stabilizes the catalyst by reducing surface energy and enhancing sulfur redox kinetics. Theoretical calculations confirm that In doping, in conjunction with surface vacancies, optimizes charge distribution and generates unpaired electrons near the Fermi level, thus improving polysulfide adsorption and lowering Li 2 S formation barriers. LSBs with In‐Vs‐MoS 2 separators deliver stable cycling at 0.5 C with a favorable capacity of 1042 mAh g −1 retained after 100 cycles. Moreover, even at high current density (5 C) and high S loading (8.7 mg cm −2 ) scenario, stable cycling is realized, demonstrating the strategy's effectiveness in advancing LSB electrocatalysis. This work offers a straightforward strategy for practical LSBs and deepens the understanding of vacancy‐modulated electrocatalysts for sulfur redox.

Article Details

Volume / Issue Vol. 37, Issue 34
Published August 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (10)

Q

Qingbin Jiang

H

Huifang Xu

K

Kwan San Hui

Y

Yijie Wei

School of Pharmacy Nanchang University Nanchang China

L

Lingwen Liu

Z

Zhengqing Ye

Joint Key Laboratory of the Ministry of Education Institute of Applied Physics and Materials Engineering University of Macau Avenida da Universidade Taipa Macau SAR China

C

Chenyang Zha

M

Mengting Zheng

J

Jun Lu

K

Kwun Nam Hui

Joint Key Laboratory of the Ministry of Education, Institute of Applied Physics and Materials Engineering, University of Macau, Avenida da Universidade, Taipa, Macau, SAR 999078, P. R. China