Nanoscale Inhomogeneity and Epitaxial Strain Control Metallicity in Single Crystalline Thin Films of High Entropy Oxide

N Nandana Bhattacharya S Suresh Chandra Joshi (Department of Physics Indian Institute of Science Bengaluru 560012 India) R Ranjan Kumar Patel (Department of Physics Indian Institute of Science Bengaluru 560012 India) J Jianwei Zhang (Biotech Drug Research Center, Shanghai Institute of Materia Medica, Chinese Academy of Sciences) A Akash Saha P Prithwijit Mandal (Department of Materials Science and Engineering, University of Wisconsin-Madison 4 , Madison, Wisconsin 53706,) S Shashank Kumar Ojha (Rice Advanced Materials Institute) A Andrei Gloskovskii (Deutsches Elektronen‐Synchrotron DESY 22607 Hamburg Germany) C Christoph Schlueter J John W. Freeland (Advanced Photon Source, Argonne National Laboratory) Z Zhan Zhang H Hua Zhou (X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, IL, USA.) Z Zhenzhong Yang (Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, School of Information and Electronic Engineering) S Srimanta Middey

Abstract

Abstract Understanding the electronic transport properties of thin films of high‐entropy oxide (HEO), having multiple elements at the same crystallographic site, is crucial for their potential electronic applications. However, very little is known about the metallic phase of HEOs even in bulk form. This work delves into the interplay between global and local structural distortion and electronic properties of single crystalline thin films of (La 0.2 Pr 0.2 Nd 0.2 Sm 0.2 Eu 0.2 )NiO 3 , which exhibit metal‐insulator transition under tensile strain. Employing electron microscopy and elemental resolved electron energy loss spectroscopy, we provide direct evidence of nanoscale chemical inhomogeneities at the rare‐earth site, leading to a broad distribution of Ni–O–Ni bond angles. However, the octahedral rotation pattern remains the same throughout. The metallic phase consists of insulating patches with more distorted Ni–O–Ni bond angles, responsible for higher resistance exponents with increased compositional complexity. Moreover, a rare, fully metallic state of HEO thin film is achieved under compressive strain. We further demonstrate a direct correlation between the suppression of the insulating behavior and increased electronic hopping. Our findings provide a foundation for exploring Mott‐Anderson electron localization physics in the high‐entropy regime.

Article Details

Volume / Issue Vol. 37, Issue 27
Published July 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (14)

N

Nandana Bhattacharya

S

Suresh Chandra Joshi

Department of Physics Indian Institute of Science Bengaluru 560012 India

R

Ranjan Kumar Patel

Department of Physics Indian Institute of Science Bengaluru 560012 India

J

Jianwei Zhang

Biotech Drug Research Center, Shanghai Institute of Materia Medica, Chinese Academy of Sciences

A

Akash Saha

P

Prithwijit Mandal

Department of Materials Science and Engineering, University of Wisconsin-Madison 4 , Madison, Wisconsin 53706,

S

Shashank Kumar Ojha

Rice Advanced Materials Institute

A

Andrei Gloskovskii

Deutsches Elektronen‐Synchrotron DESY 22607 Hamburg Germany

C

Christoph Schlueter

J

John W. Freeland

Advanced Photon Source, Argonne National Laboratory

Z

Zhan Zhang

H

Hua Zhou

X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, IL, USA.

Z

Zhenzhong Yang

Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, School of Information and Electronic Engineering

S

Srimanta Middey