Nanoscale Inhomogeneity and Epitaxial Strain Control Metallicity in Single Crystalline Thin Films of High Entropy Oxide
Abstract
Abstract Understanding the electronic transport properties of thin films of high‐entropy oxide (HEO), having multiple elements at the same crystallographic site, is crucial for their potential electronic applications. However, very little is known about the metallic phase of HEOs even in bulk form. This work delves into the interplay between global and local structural distortion and electronic properties of single crystalline thin films of (La 0.2 Pr 0.2 Nd 0.2 Sm 0.2 Eu 0.2 )NiO 3 , which exhibit metal‐insulator transition under tensile strain. Employing electron microscopy and elemental resolved electron energy loss spectroscopy, we provide direct evidence of nanoscale chemical inhomogeneities at the rare‐earth site, leading to a broad distribution of Ni–O–Ni bond angles. However, the octahedral rotation pattern remains the same throughout. The metallic phase consists of insulating patches with more distorted Ni–O–Ni bond angles, responsible for higher resistance exponents with increased compositional complexity. Moreover, a rare, fully metallic state of HEO thin film is achieved under compressive strain. We further demonstrate a direct correlation between the suppression of the insulating behavior and increased electronic hopping. Our findings provide a foundation for exploring Mott‐Anderson electron localization physics in the high‐entropy regime.
Article Details
Authors (14)
Nandana Bhattacharya
Suresh Chandra Joshi
Department of Physics Indian Institute of Science Bengaluru 560012 India
Ranjan Kumar Patel
Department of Physics Indian Institute of Science Bengaluru 560012 India
Jianwei Zhang
Biotech Drug Research Center, Shanghai Institute of Materia Medica, Chinese Academy of Sciences
Akash Saha
Prithwijit Mandal
Department of Materials Science and Engineering, University of Wisconsin-Madison 4 , Madison, Wisconsin 53706,
Shashank Kumar Ojha
Rice Advanced Materials Institute
Andrei Gloskovskii
Deutsches Elektronen‐Synchrotron DESY 22607 Hamburg Germany
Christoph Schlueter
John W. Freeland
Advanced Photon Source, Argonne National Laboratory
Zhan Zhang
Hua Zhou
X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, IL, USA.
Zhenzhong Yang
Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, School of Information and Electronic Engineering
Srimanta Middey