Photo‐Patternable PEDOT:PSS for High Performance Organic Electrochemical Transistors

C Charles‐Théophile Coen (Department of Mechanical Engineering Microsystems Eindhoven University of Technology Eindhoven The Netherlands) N Niels J. Burghoorn (Department of Mechanical Engineering Microsystems Eindhoven University of Technology Eindhoven The Netherlands) J Jonas G. Hendrikx (Department of Mechanical Engineering Dynamics and Control Eindhoven University of Technology Eindhoven The Netherlands) J Jaap den Toonder (Department of Mechanical Engineering Microsystems Eindhoven University of Technology Eindhoven The Netherlands) Y Yoeri van de Burgt (Department of Mechanical Engineering Microsystems Eindhoven University of Technology Eindhoven The Netherlands)

Abstract

ABSTRACT Organic mixed ionic‐electronic conductors (OMIECs) have the unique ability to transport both ionic and electronic charges, making them the ideal choice for interaction between biology (ionic) and human technology (electronic). Applied first to sense biological environments, OMIECs are now used to develop brain‐inspired circuits capable of seamlessly “communicating” with biology. However, patterning these organic materials in complex circuits is a challenge as traditional microfabrication techniques are not fully compatible. Current research is still heavily relying on a technique called peel‐off, which involves the physical removal of a sacrificial layer, making it cumbersome to develop highly integrated circuits. To circumvent these fabrication limitations, a photo‐patternable PEDOT:PSS is developed by blending it with a photo‐sensitive interpenetrating network, allowing features down to 2 µm to be patterned using photolithography on a wide range of substrates. The process fully retains the ability of the OMIEC to transport ions and electrical charges; moreover, organic electrochemical transistors fabricated using this technique outperform the widely used chemically‐cross‐linked GOPS PEDOT:PSS, while having a batch‐to‐batch variability below 5%. Our photo‐patterning process opens the door to monolithic fabrication of miniaturized and highly integrated circuits, allowing to push the limits of interaction between biology and man‐made technology.

Article Details

Volume / Issue Vol. 38, Issue 21
Published April 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (5)

C

Charles‐Théophile Coen

Department of Mechanical Engineering Microsystems Eindhoven University of Technology Eindhoven The Netherlands

N

Niels J. Burghoorn

Department of Mechanical Engineering Microsystems Eindhoven University of Technology Eindhoven The Netherlands

J

Jonas G. Hendrikx

Department of Mechanical Engineering Dynamics and Control Eindhoven University of Technology Eindhoven The Netherlands

J

Jaap den Toonder

Department of Mechanical Engineering Microsystems Eindhoven University of Technology Eindhoven The Netherlands

Y

Yoeri van de Burgt

Department of Mechanical Engineering Microsystems Eindhoven University of Technology Eindhoven The Netherlands