Proton Reservoir in Covalent Organic Framework Compensating Oxygen Reduction Reaction Enhances Hydrogen Peroxide Photosynthesis

C Chenglong Sun Y Ying Han H Hongyu Guo R Rui Zhao Y Youxing Liu (Beijing University of Chemical Technology , , ,) Z Zheng Lin (School of Materials Science and Engineering) Z Zehao Xiao Z Zongqiang Sun (School of Materials Science and Engineering, Department of Geriatric Dentistry at School and Hospital of Stomatology, Peking University) M Mingchuan Luo (Peking University , , ,) S Shaojun Guo

Abstract

Abstract The water oxidation reaction (WOR) with sluggish kinetics usually fails to adequately furnish protons to oxygen reduction reaction (ORR), which ultimately constrains the overall efficiency of photocatalytic synthesis of H 2 O 2 , particularly in the absence of sacrificial agents. Herein, a class of hydroxyl groups (─OH) functionalized covalent organic framework (COF) is reported as a proton reservoir to compensate ORR for greatly improving the efficiency of H 2 O 2 photosynthesis. It has been demonstrated that the incorporation of ─OH into the TFBP‐DHBD (TFBP: 1,2,4,5‐tetrakis‐(4‐formylphenyl)benzene, DHBD: 3,3′‐dihydroxybenzidine) COF can achieve a 3.3 times higher H 2 O 2 photosynthetic activity than that of TFBP‐BD (BD: benzidine) COF without ─OH groups. Isotope labeling experiments and in situ infrared spectroscopy analysis demonstrate that the proton reservoir can donate protons for ORR and subsequently regain the released protons from WOR. Theoretical calculations further confirm that the ─OH functionalized COF provides the protons for the formation of *OOH intermediate and reduces its energy barrier, thereby facilitating the photosynthesis of H 2 O 2 . A novel COF loaded with Al 2 O 3 spheres‐based streamlined microreactor is built that can simultaneously achieve production of H 2 O 2 and elimination of bacteria over 1.3 × 10 4 CFU mL −1 , superior to the reported continuous flow photocatalytic reactors.

Article Details

Volume / Issue Vol. 37, Issue 21
Published May 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (10)

C

Chenglong Sun

Y

Ying Han

H

Hongyu Guo

R

Rui Zhao

Y

Youxing Liu

Beijing University of Chemical Technology , , ,

Z

Zheng Lin

School of Materials Science and Engineering

Z

Zehao Xiao

Z

Zongqiang Sun

School of Materials Science and Engineering, Department of Geriatric Dentistry at School and Hospital of Stomatology, Peking University

M

Mingchuan Luo

Peking University , , ,

S

Shaojun Guo