Quantitatively Predicting Angle‐Resolved Polarized Raman Intensity of Anisotropic Layered Materials
Abstract
Abstract Angle‐resolved polarized Raman (ARPR) spectroscopy provides insights into optical anisotropy and symmetry‐related electron–photon/electron–phonon couplings of anisotropic layered materials (ALMs). However, since their discovery over ten years ago, ARPR responses in ALM flakes has exhibited a puzzling dependence on flake thickness, excitation wavelength, and dielectric environment, complicating their understanding and prediction. By taking black phosphorus (BP) (⩾20 nm) flakes and four‐layer Td‐WTe 2 as examples, this study introduces intrinsic Raman tensors ( R int ) and proposes strategies to predict the ARPR intensity profiles of thick and atomically‐thin ALM flakes by considering birefringence, linear dichroism and multilayer interference inside multilayered structures with experimentally determined complex refractive indexes along in‐plane axes and complex tensor elements of R int for the corresponding phonon modes. The tensor elements of effective Raman tensors ( R eff ), which are directly linked to the polarization vectors of incident and scattered light outside the ALM surface, are derived to quantitatively predict ARPR intensity for these ALM flakes, showing intricate dependence on ALM thickness, dielectric substrates, and excitation wavelengths. This framework can be extended to other ALM flakes from atomically‐thin layers to bulk limit, facilitating comprehensive prediction of their ARPR intensity regardless of layer‐dependent electronic properties.
Article Details
Authors (11)
Jia‐Liang Xie
State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China
Tao Liu
Yu‐Chen Leng
State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China
Rui Mei
State Key Laboratory of Semiconductor Physics and Chip Technologies
Heng Wu
Chen‐Kai Liu
State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China
Jia‐Hong Wang
Center of Materials Science and Optoelectronics Engineering University of Chinese Academy of Sciences Beijing 100049 China
Yang Li
Xue‐Feng Yu
Materials Artificial Intelligence Center, Shenzhen Institutes of Advanced Technology Chinese Academy of Sciences 1068 Xueyuan Avenue Shenzhen 518055 P.R. China
Miao‐Ling Lin
State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China
Ping‐Heng Tan
State Key Laboratory of Semiconductor Physics and Chip Technologies Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China