Ring‐Opening Polymerization of Surface Ligands Enables Versatile Optical Patterning and Form Factor Flexibility in Quantum Dot Assemblies
Abstract
Abstract The evolution of display technologies is rapidly transitioning from traditional screens to advanced augmented reality (AR)/virtual reality (VR) and wearable devices, where quantum dots (QDs) serve as crucial pure‐color emitters. While solution processing efficiently forms QD solids, challenges emerge in subsequent stages, such as layer deposition, etching, and solvent immersion. These issues become especially pronounced when developing diverse form factors, necessitating innovative patterning methods that are both reversible and sustainable. Herein, a novel approach utilizing lipoic acid (LA) as a ligand is presented, featuring a carboxylic acid group for QD surface attachment and a reversible disulfide ring structure. Upon i‐line UV exposure, the LA ligand initiates ring‐opening polymerization (ROP), crosslinking the QDs and enhances their solvent resistance. This method enables precise full‐color QD patterns with feature sizes as small as 3 µm and pixel densities exceeding 3788 ppi. Additionally, it supports the fabrication of stretchable QD composites using LA‐derived monomers. The reversible ROP process allows for flexibility, self‐healing, and QD recovery, promoting sustainability and expanding QD applications for ultra‐fine patterning and on‐silicon displays.
Article Details
Authors (17)
Yunseo Lee
Jiyun Shin
Solutions to Electromagnetic Interference in Future‐mobility Research Center Korea Institute of Science and Technology Seoul 02792 Republic of Korea
Seungki Shin
Division of Materials Science and Engineering Hanyang University Seoul 04763 Republic of Korea
Eun A Kim
Department of Photonics and Nanoelectronics BK21 FOUR ERICA‐ACE Center Hanyang University ERICA Ansan 15588 Republic of Korea
Joon Yup Lee
Department of Photonics and Nanoelectronics BK21 FOUR ERICA‐ACE Center Hanyang University ERICA Ansan 15588 Republic of Korea
Namyoung Gwak
Seongchan Kim
Jaeyoung Seo
Division of Materials Science and Engineering Hanyang University Seoul 04763 Republic of Korea
Hyein Kong
Division of Materials Science and Engineering Hanyang University Seoul 04763 Republic of Korea
Dongjoon Yeo
Division of Materials Science and Engineering Hanyang University Seoul 04763 Republic of Korea
Jina Na
Division of Materials Science and Engineering Hanyang University Seoul 04763 Republic of Korea
Sungwon Kim
Juho Lee
Seong‐Yong Cho
Department of Photonics and Nanoelectronics BK21 FOUR ERICA‐ACE Center Hanyang University ERICA Ansan 15588 Republic of Korea
Jaejun Lee
Tae Ann Kim
Solutions to Electromagnetic Interference in Future‐mobility Research Center Korea Institute of Science and Technology Seoul 02792 Republic of Korea
Nuri Oh