Sub‐3 nm Ruthenium Nanopatterns Enabled by Pattern Transfer From Supramolecular Dendrimer Templates

Y Yeongjae Ham (National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea) G Gwangyeop Kim (National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea) K Kangho Park (National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea) W Wonmoo Lee (National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea) E Euijin Lee (National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea) A Aqil Jamal (Research and Development Center, Saudi Aramco, Dhahran, Saudi Arabia.) I Issam Gereige (Aramco Research Center (ARC)) A Ahyeon Cho (National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea) K Kiok Kwon (Green Chemistry and Materials Group Research Institute of Sustainable Manufacturing System Korea Institute of Industrial Technology Cheonan Republic of Korea) H Hee‐Tae Jung (Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea)

Abstract

ABSTRACT The fabrication of inorganic‐based nanopatterns with feature sizes below 3 nm remains a fundamental challenge in nanoscience and advanced manufacturing. Existing approaches, including extreme ultraviolet lithography, block copolymer self‐assembly, and colloidal nanocrystal patterning, struggle to reliably achieve such dimensions while maintaining long‐range order and structural fidelity. Here, we present a pattern transfer technique from a supramolecular dendrimer templating strategy that enables highly ordered sub‐3 nm ruthenium‐based nanostructures over large areas (1 µm × 1 µm). The pristine dendrimer template forms a hexagonally packed cylindrical morphology with sub‐5 nm periodicity, exhibiting structural stability and long‐range order. Thermal annealing induces cooperative self‐assembly into a single‐domain array, which is selectively stained with RuO 4 to generate an inorganic RuO 2 core while preserving structural registry. This Ru‐incorporated dendrimer architecture shows markedly enhanced thermal and structural stability. Electron microscopy and elemental mapping confirm vertically aligned cylindrical domains with high pattern fidelity. Subsequent calcination at 250°C removes unstained organic components without structural collapse, yielding periodic Ru‐based nanostructures with a characteristic feature size of ∼2.5 nm. This work establishes a versatile bottom‐up platform for ultrahigh‐resolution patterning beyond current lithographic limits and provides a scalable route toward next‐generation nanoelectronic, catalytic, and quantum device architectures.

Article Details

Volume / Issue Vol. 38, Issue 45
Published August 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (10)

Y

Yeongjae Ham

National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea

G

Gwangyeop Kim

National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea

K

Kangho Park

National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea

W

Wonmoo Lee

National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea

E

Euijin Lee

National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea

A

Aqil Jamal

Research and Development Center, Saudi Aramco, Dhahran, Saudi Arabia.

I

Issam Gereige

Aramco Research Center (ARC)

A

Ahyeon Cho

National Laboratory for Organic Opto‐Electronics Materials Laboratory Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea

K

Kiok Kwon

Green Chemistry and Materials Group Research Institute of Sustainable Manufacturing System Korea Institute of Industrial Technology Cheonan Republic of Korea

H

Hee‐Tae Jung

Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea