Surface Reordering During Layer‐by‐Layer Growth on SrTiO <sub>3</sub>

I I‐Cheng Tung (X‐ray Science Division, Advanced Photon Source Argonne National Laboratory Lemont USA) X Xi Yan J June‐Hyuk Lee (X‐ray Science Division, Advanced Photon Source Argonne National Laboratory Lemont USA) Y Yang Liu S Seo Hyoung Chang (Materials Science Division Argonne National Laboratory Lemont USA) Z Zhenlin Luo F Friederike Wrobel (Materials Science Division Argonne National Laboratory Lemont USA) N Nicholas T. Cheung (Department of Physics and Astronomy James Madison University Harrisonburg USA) K Kaden R. Lopez (Department of Physics and Astronomy James Madison University Harrisonburg USA) M Michael J. Bedzyk (Department of Physics and Astronomy, Northwestern University 3 , Evanston, Illinois 60208,) H Hawoong Hong (X‐ray Science Division, Advanced Photon Source Argonne National Laboratory Lemont USA) J John W. Freeland (Advanced Photon Source, Argonne National Laboratory) H Hua Zhou (X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, IL, USA.) K Kendra Letchworth‐Weaver (Department of Physics and Astronomy James Madison University Harrisonburg USA) D Dillon D. Fong (Materials Science Division Argonne National Laboratory Lemont USA)

Abstract

ABSTRACT With the development of layer‐by‐layer growth techniques such as molecular beam epitaxy (MBE), it is now possible to construct materials with atomic‐level precision, with the layer sequence primarily determined by the growth recipe. However, materials can still restructure in the high‐temperature growth environment with surface thermodynamics strongly influencing growth behavior. Here, we demonstrate that growth on (001), the principal platform for oxide electronics, does not occur in a layer‐by‐layer fashion but follows a more complex process in which a plane continually diffuses toward the growth surface. Employing in situ synchrotron X‐ray scattering combined with ab initio thermodynamic calculations, we discover the existence of a stable double‐layer structure on the pristine substrate and the occurrence of dynamic layer rearrangement during homoepitaxial growth by oxide MBE. Our findings suggest that the current methods used to precisely control surfaces are limited, as well as our ability to dictate the composition of ultrathin films, resulting in important ramifications regarding the surface reactivity of perovskite materials grown on .

Article Details

Volume / Issue Vol. 38, Issue 19
Published April 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (15)

I

I‐Cheng Tung

X‐ray Science Division, Advanced Photon Source Argonne National Laboratory Lemont USA

X

Xi Yan

J

June‐Hyuk Lee

X‐ray Science Division, Advanced Photon Source Argonne National Laboratory Lemont USA

Y

Yang Liu

S

Seo Hyoung Chang

Materials Science Division Argonne National Laboratory Lemont USA

Z

Zhenlin Luo

F

Friederike Wrobel

Materials Science Division Argonne National Laboratory Lemont USA

N

Nicholas T. Cheung

Department of Physics and Astronomy James Madison University Harrisonburg USA

K

Kaden R. Lopez

Department of Physics and Astronomy James Madison University Harrisonburg USA

M

Michael J. Bedzyk

Department of Physics and Astronomy, Northwestern University 3 , Evanston, Illinois 60208,

H

Hawoong Hong

X‐ray Science Division, Advanced Photon Source Argonne National Laboratory Lemont USA

J

John W. Freeland

Advanced Photon Source, Argonne National Laboratory

H

Hua Zhou

X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, IL, USA.

K

Kendra Letchworth‐Weaver

Department of Physics and Astronomy James Madison University Harrisonburg USA

D

Dillon D. Fong

Materials Science Division Argonne National Laboratory Lemont USA