Topologically Epitaxial Conductive Filaments in Oxide Artificial Synapses Enable Neuroglia‐Like Regulatory Dynamics for Embodied Intelligence

C Chen Luo (College of Plant Protection, Yangzhou University) Z Zuheng Wu Z Zhe Yu Y Yunlai Zhu Z Zongyi Li (In Situ Devices Center School of Integrated Circuits East China Normal University Shanghai China) Z Zuoyuan Dong J Jialu Huang (School of Chemistry and Chemical Engineering, Nantong University 1 , Nantong 226019,) J Jingming Zhou (In Situ Devices Center School of Integrated Circuits East China Normal University Shanghai China) X Xiaomei Li L Litao Sun (School of Public Health (Shenzhen), Shenzhen Campus of Sun Yat-sen University) J Junhao Chu (State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics) X Xing Wu Q Qi Liu

Abstract

ABSTRACT Resistance random access memory (RRAM) has emerged as a critical device for neuromorphic computing, offering significant potential for synaptic simulation. Nevertheless, it remains challenging to control the stochastic nature of the conductive filaments (CFs) in oxide‐based artificial synapses, leaving a critical gap between biological plasticity and neuromorphic reliability. Here, inspirated from the directional guidance of growth factors and the mechanical traction exerted by glia during axonal outgrowth, and apply these biological principles into a topo‐epitaxial self‐assembly protocol that steers every step of CF growth. By prescribing both the ionic trajectory and the structural registry of the nascent filament, we suppress intrinsic transport stochasticity and enforce crystallographic coherence. The result is atomic‐precision control over ion migration and single‐crystalline CF formation—achieved within standard CMOS flows, without extra masks or exotic processing. Finally, by constructing a behavior‐level model based on the habituation characteristics of oxide artificial synapses, the application in obstacle avoidance is successfully presented. Our synapses empower embodied AI robots with rich, robust, and self‐adaptive behaviors.

Article Details

Volume / Issue Vol. 38, Issue 12
Published February 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (13)

C

Chen Luo

College of Plant Protection, Yangzhou University

Z

Zuheng Wu

Z

Zhe Yu

Y

Yunlai Zhu

Z

Zongyi Li

In Situ Devices Center School of Integrated Circuits East China Normal University Shanghai China

Z

Zuoyuan Dong

J

Jialu Huang

School of Chemistry and Chemical Engineering, Nantong University 1 , Nantong 226019,

J

Jingming Zhou

In Situ Devices Center School of Integrated Circuits East China Normal University Shanghai China

X

Xiaomei Li

L

Litao Sun

School of Public Health (Shenzhen), Shenzhen Campus of Sun Yat-sen University

J

Junhao Chu

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics

X

Xing Wu

Q

Qi Liu