Unveiling Transition Dipole Moment Anisotropy and Symmetry Breaking Mechanism in Wurtzite Nitride Toward Polarization‐Sensitive Ultraviolet Detection
Abstract
ABSTRACT Polarization detection in shortwave spectrum using wurtzite wide‐bandgap semiconductors remains challenging due to the isotropic limitations of conventional polar crystal planes. Nonpolar planes offer a promising route, yet the underlying physical mechanism is unclear. Here, we establish a direct correlation between crystallographic polarity and anisotropic photoresponse on nonpolar a‐plane GaN, demonstrating an intrinsic polarization‐sensitive photodetection scheme. Crystal‐field‐induced valence band splitting yields distinct transition dipole moments from heavy‐hole and crystal field split‐off bands to the conduction band minimum, enabling selective absorption for light polarized perpendicular or parallel to the c‐axis. Using the nonpolar plane of GaN, electron transition probability between the heavy‐hole band and conduction band minimum for polarization perpendicular to the c‐axis is selectively enhanced, governing polarization‐angle‐dependent absorption. Our device achieves a high dichroic ratio of 3.79 (318% higher than c‐plane) and an ultrafast response speed of 1.7 µs at 10 V, surpassing conventional polar‐plane architectures and prior polarization‐sensitive detectors. Furthermore, by introducing an oxygen injection layer to strategically break lattice symmetry, anisotropic charge density distribution around oxygen atoms further enhances the dichroic ratio. Exceptional polarization discrimination is validated in single‐pixel polarized imaging and intensity/polarization binary‐channel optical communication encryption. This work establishes a material‐intrinsic paradigm for high‐sensitivity polarization detection, offering new perspectives for multidimensional optoelectronics.
Article Details
Authors (15)
Jinjie Zhu
Qing Cai
National Key Laboratory of Agricultural Microbiology, Huazhong Agricultural University
Shengjie Zhang
Key Laboratory of Interfacial Physics and Technology, Shanghai Institute of Applied Physics
Pengfei Shao
Huiqin Zhao
Key Laboratory of Advanced Photonic and Electronic Materials, Key Laboratory of Optoelectronic Devices and Systems with Extreme Performances of MOE, School of Electronic Science and Engineering, Nanjing University 2 , Nanjing 210023,
Saisai Wang
Linling Xu
Haifan You
Hui Guo
Bin Liu
Hai Lu
Jiandong Ye
School of Electronic Science and Engineering, Nanjing University 2 , Nanjing 210023,
Youdou Zheng
School of Electronic Science and Engineering, Nanjing University 2 , Nanjing 210023,
Rong Zhang
Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong 999077, China
Dunjun Chen